Inventor
Joseph J. Sizensky
Inventor
Seekonk, MA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
C11DDetergent compositions2%
PatentTitleYear
6,380,317'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20026,309,793'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20016,159,653'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20006,133,412'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20006,027,853'Process for preparing a radiation-sensitive composition'20005,985,507'Selected high thermal novolaks and positive-working radiation-sensitive compositions'19995,494,785'High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns'19965,473,045'High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions'19955,413,894'High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions'19955,350,827'Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions'19945,338,652'Selected structurally defined novolak binder resins and their use in photoresist pattern formation'19945,306,594'Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol'19945,053,479'Thermally stable phenolic resin compositions and their use in light-sensitive compositions'19915,001,040'Process of forming resist image in positive photoresist with thermally stable phenolic resin'19914,959,292'Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde'19904,617,251'Stripping composition and method of using the same'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1991Patents assigned to OLIN HUNT SPECIALTY PROD (3)· patent assignee history
1986–2002Based in Seekonk, MA, US· patent location history
1991–1996Patents assigned to OCG MICROELECTRONIC MATERIALS (6)· patent assignee history
1999–2000Patents assigned to OLIN MICROELECTRONIC CHEM INC (2)· patent assignee history
2000–2002Patents assigned to ARCH SPEC CHEM INC (3)· patent assignee history
2000Patents assigned to ARCH CHEM INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| OCG MICROELECTRONIC MATERIALS | 6 | 1991–1996 |
| ARCH SPEC CHEM INC | 3 | 2000–2002 |
| OLIN HUNT SPECIALTY PROD | 3 | 1986–1991 |
| OLIN MICROELECTRONIC CHEM INC | 2 | 1999–2000 |
| ARCH CHEM INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seekonk, Massachusetts, US | 16 | 1986–2002 |