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Inventor

Ryuji Okamura

Inventor
Shiga, JP

Overview

65→
Patents
1990–2020
Patent span
Physics
Primary field (CPC G)

Patents· 65 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material21%
G03GElectrography17%
H01JElectric discharge tubes or discharge lamps12%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
Y02PClimate change mitigation technologies in the production or processing of goods5%
B60WConjoint control of vehicle sub-units of different type or different function4%
B62DMotor vehicles4%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
G08GTraffic control systems2%
PatentTitleYear
10,789,847Parking assist device, parking assist method, and parking assist system202010,464,554Vehicle controller20199,846,430Vehicle control system20179,725,117'Parking assist system'20179,643,602'Parking support device'20179,598,106'Parking assistance device'20179,299,260'Image display device, and image display method'20169,296,336'Image display device and image display method'20169,037,332'Vehicle having obstacle detection device'20158,958,986'Parking assistance apparatus'20158,958,929'Vehicle control apparatus'20158,768,575'Vehicle periphery monitoring device'20148,667,935'Intake/exhaust valve control device for internal combustion engine'20148,620,560'Internal combustion engine control device'20137,060,406'Light-receiving member, image-forming apparatus, and image-forming method'20067,033,717'Process for producing electrophotographic photosensitive member, and electrophotographic photosensitive member and electrophotographic apparatus making use of the same'20067,033,721'Method for producing electrophotographic photosensitive member, electrophotographic photosensitive member and electrophotographic apparatus using the same'20066,946,167'Deposited film forming apparatus and deposited film forming method'20056,846,600'Electrophotographic photosensitive member, process for its production, and electrophotographic apparatus'20056,753,123'Process and apparatus for manufacturing electrophotographic photosensitive member'20046,702,898'Deposited film forming apparatus'20046,649,020'Plasma processing apparatus'20036,645,688'Image-forming apparatus and image-forming method'20036,635,397'Negative-charging electrophotographic photosensitive member'20036,586,149'Light-receiving member, image-forming apparatus, and image-forming method'20036,576,387'Image-forming apparatus and image-forming method'20036,528,130'Exhaust process and film depositing method using the exhaust process'20036,500,500'Method for forming a deposited film by plasma chemical vapor deposition'20026,413,592'Apparatus for forming a deposited film by plasma chemical vapor deposition'20026,406,824'Electrophotographic photosensitive member and electrophotographic apparatus having the photosensitive member'20026,350,497'Plasma processing method'20026,347,601'Film forming apparatus'20026,336,423'Apparatus for forming a deposited film by plasma chemical vapor deposition'20026,321,759'Method for cleaning a substrate'20016,300,225'Plasma processing method'20016,285,566'RCC power supply with remote disabling of oscillation frequency control'20016,282,400'Image-forming apparatus and image forming method using a controlled dynamic frictional force between a cleaning blade and a photosensitive member'20016,218,064'Electrophotographic apparatus and electrophotographic light receiving member'20016,203,618'Exhaust system and vacuum processing apparatus'20016,165,274'Plasma processing apparatus and method'20006,155,201'Plasma processing apparatus and plasma processing method'20006,148,763'Deposited film forming apparatus'20006,135,053'Apparatus for forming a deposited film by plasma chemical vapor deposition'20006,078,508'Self-oscillation type switching power supply apparatus'20005,817,181'Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus'19985,656,404'Light receiving member with an amorphous silicon photoconductive layer containing fluorine atoms in an amount of 1 to 95 atomic ppm'19975,637,358'Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet'19975,624,776'Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof'19975,597,623'Process for using microwave plasma CVD'19975,514,506'Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers'19965,514,217'Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof'19965,480,627'Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member'19965,455,138'Process for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus'19955,443,645'Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure'19955,439,715'Process and apparatus for microwave plasma chemical vapor deposition'19955,433,790'Deposit film forming apparatus with microwave CVD method'19955,407,768'Light-receiving member'19955,360,484'Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film'19945,314,780'Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member'19945,284,730'Electrophotographic light-receiving member'19945,273,851'Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C'19935,232,507'Apparatus for forming deposited films with microwave plasma CVD method'19935,030,476'Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition'19915,016,565'Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge'19914,954,397'Light receiving member having a divided-functionally structured light receiving layer having CGL and CTL for use in electrophotography'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2006Patents assigned to CANON KK (49)· patent assignee history
1990–1997Based in Shiga, JP· patent location history
2000–2005Based in Kyoto, JP· patent location history
2000–2002Based in Nishikamo-gun, JP· patent location history
2003–2006Based in Shizuoka, JP· patent location history
2013–2020Patents assigned to TOYOTA MOTOR CO LTD (14)· patent assignee history
2013–2017Patents assigned to OKAMURA RYUJI (9)· patent assignee history
2013–2017Based in Toyota, JP· patent location history
2014–2017Patents assigned to HIEI YU (7)· patent assignee history
2014–2017Patents assigned to SOBUE YUKA (7)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK491990–2006
TOYOTA MOTOR CO LTD142013–2020
OKAMURA RYUJIself92013–2017
HIEI YU72014–2017
SOBUE YUKA72014–2017
Locations
LocationPatentsSpan
Shiga, JP151990–1997
Kyoto, JP102000–2005
Toyota, JP92013–2017
Shizuoka, JP72003–2006
Nishikamo-gun, JP52000–2002