Inventor

Gerhard Pohlers

Inventor

Needham, MA, US

Overview

26→

Patents

2002–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

C07CAcyclic or carbocyclic compounds13%

C07DHeterocyclic compounds7%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

H01LSemiconductor devices5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C09DCoating compositions, e.g. paints, varnishes or lacquers4%

C08LCompositions of macromolecular compounds3%

H10DInorganic electric semiconductor devices3%

PatentTitleYear

10,821,433Ion exchange resins, purification methods and methods of making ionic resins2020 10,719,014Photoresists comprising amide component2020 10,527,934Photoresists comprising ionic compound2020 10,481,495Topcoat compositions containing fluorinated thermal acid generators2019 10,370,320Purification methods2019 10,295,910Photoresists and methods of use thereof2019 10,241,407Thermal acid generators and photoresist pattern trimming compositions and methods2019 10,241,411Topcoat compositions containing fluorinated thermal acid generators2019 10,162,266Photoresist pattern trimming methods2018 10,007,179Thermal acid generators and photoresist pattern trimming compositions and methods2018 9,665,001'Photoresists and methods for use thereof'2017 9,541,834'Ionic thermal acid generators for low temperature applications'2017 9,502,254'Photoresists and methods for use thereof'2016 9,475,763'Photoresist comprising nitrogen-containing compound'2016 9,448,486'Photoresist pattern trimming compositions and methods'2016 9,209,028'Ion implantation methods'2015 9,012,128'Photoresist and coated substrate comprising same'2015 8,927,190'Photoresist comprising nitrogen-containing compound'2015 8,815,754'Photoresists and methods for use thereof'2014 8,722,825'Surface active additive and photoresist composition comprising same'2014 6,858,379'Photoresist compositions for short wavelength imaging'2005 6,811,961'Photoacid generator systems for short wavelength imaging'2004 6,783,912'Photoacid generators and photoresists comprising same'2004 6,770,407'Methods for monitoring photoresists'2004 6,664,022'Photoacid generators and photoresists comprising same'2003 6,482,567'Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2005Patents assigned to SHIPLEY CO LLC (6)· patent assignee history

2002–2016Based in Newton, MA, US· patent location history

2014–2020Patents assigned to ROHM & HAAS ELECT MAT (19)· patent assignee history

2014–2019Patents assigned to POHLERS GERHARD (5)· patent assignee history

2014–2015Patents assigned to LIU CONG (2)· patent assignee history

2014–2015Patents assigned to WU CHUNYI (2)· patent assignee history

2014–2020Based in Needham, MA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ROHM & HAAS ELECT MAT	19	2014–2020
SHIPLEY CO LLC	6	2002–2005
POHLERS GERHARDself	5	2014–2019
LIU CONG	2	2014–2015
WU CHUNYI	2	2014–2015

Locations

Location	Patents	Span
Needham, Massachusetts, US	19	2014–2020
Newton, Massachusetts, US	7	2002–2016