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Inventor

Minoru Inomoto

Inventor
Kanagawa, JP

Overview

3→
Patents
2010–2015
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B29DProducing particular articles from plastics or from substances in a plastic state20%
G02BOptical elements, systems or apparatus20%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them20%
PatentTitleYear
9,188,879'Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method'20158,953,249'Method of manufacturing an apodizer, and optical module'20157,682,757'Pattern layout for forming integrated circuit'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2015Patents assigned to TOSHIBA KK (3)· patent assignee history
2010Based in Suzuka, JP· patent location history
2015Patents assigned to INANAMI RYOICHI (1)· patent assignee history
2015Patents assigned to INOMOTO MINORU (1)· patent assignee history
2015Patents assigned to KASA KENTARO (1)· patent assignee history
2015Patents assigned to KOIZUMI HIROSHI (1)· patent assignee history
2015Based in Kanagawa, JP· patent location history
2015Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK32010–2015
INANAMI RYOICHI12015
INOMOTO MINORUself12015
KASA KENTARO12015
KOIZUMI HIROSHI12015
Locations
LocationPatentsSpan
Kanagawa, JP12015
Yokohama, JP12015
Suzuka, JP12010