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Inventor

Jeff S. Cheung

Inventor
Hayward, CA, US

Overview

2→
Patents
2002–2005
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H01JElectric discharge tubes or discharge lamps33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,890,403'Apparatus and process for controlling the temperature of a substrate in a plasma reactor'20056,461,980'Apparatus and process for controlling the temperature of a substrate in a plasma reactor chamber'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2005Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2002–2005Based in Hayward, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22002–2005
Locations
LocationPatentsSpan
Hayward, California, US22002–2005