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Inventor

Jacob Sonneveld

Inventor
Best, NL

Overview

2→
Patents
1998–2008
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G11BInformation storage based on relative movement between record carrier and transducer33%
PatentTitleYear
7,459,669'Sensor and lithographic apparatus'20085,708,638'Device for optically scanning a recording medium by focusing the best focus or the paraxial focus to the information layer'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Patents assigned to PHILIPS CORP (1)· patent assignee history
1998Based in Eindhoven, NL· patent location history
2008Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2008Based in Best, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12008
PHILIPS CORP11998
Locations
LocationPatentsSpan
Best, NL12008
Eindhoven, NL11998