LexDanaLexDanabeta
Inventor

Been-Der Chen

Inventor
Milpitas, CA, US

Overview

13→
Patents
2010–2021
Patent span
Physics
Primary field (CPC G)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
G06FElectric digital data processing24%
G06TImage data processing or generation, in general14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G06NComputing arrangements based on specific computational models3%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
PatentTitleYear
11,106,982Warm start generalized additive mixed-effect (game) framework20219,619,607'Method and apparatus for cost function based simultaneous OPC and SBAR optimization'20179,418,194'Method and apparatus for model based flexible MRC'20168,938,699'Multivariable solver for optical proximity correction'20158,826,198'Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)'20148,812,998'Method and apparatus for cost function based simultaneous OPC and SBAR optimization'20148,806,389'Method and apparatus for model based flexible MRC'20148,560,979'Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby'20138,448,099'Multivariable solver for optical proximity correction'20138,443,312'Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)'20138,291,352'Multivariable solver for optical proximity correction'20128,239,786'Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby'20127,707,538'Multivariable solver for optical proximity correction'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2017Based in Milpitas, CA, US· patent location history
2012–2017Patents assigned to ASML NETHERLANDS BV (11)· patent assignee history
2012–2014Patents assigned to CHEN BEEN-DER (5)· patent assignee history
2012–2014Patents assigned to LU YEN-WEN (4)· patent assignee history
2012–2013Patents assigned to WONG WILLIAM S (3)· patent assignee history
2012–2014Patents assigned to LI JIANGWEI (2)· patent assignee history
2021Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV112012–2017
CHEN BEEN-DERself52012–2014
LU YEN-WEN42012–2014
WONG WILLIAM S32012–2013
LI JIANGWEI22012–2014
Locations
LocationPatentsSpan
Milpitas, California, US122010–2017
San Jose, California, US12021