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Inventor

Yun-Kuei Yang

Inventor
Taichung, TW

Overview

2→
Patents
1998–2004
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1033%
PatentTitleYear
6,706,638'Method of forming opening in dielectric layer'20045,837,426'Photolithographic process for mask programming of read-only memory devices'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Patents assigned to UNITED MICROELECTRONICS CORP (1)· patent assignee history
1998Based in Tai Chung, TW· patent location history
2004Patents assigned to WINBOND ELECTRONICS CORP (1)· patent assignee history
2004Based in Taichung, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNITED MICROELECTRONICS CORP11998
WINBOND ELECTRONICS CORP12004
Locations
LocationPatentsSpan
Taichung, TW12004
Tai Chung, TW11998