Inventor
Soichiro Arai
Inventor
Kawasaki, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps35%
B82YSpecific uses or applications of nanostructures33%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
F02DControlling combustion engines3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
G01DMeasuring not specially adapted for a specific variable2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G06FElectric digital data processing2%
H03LAutomatic control, starting, synchronisation or stabilisation of generators of electronic oscillations or pulses2%
H03MCoding2%
PatentTitleYear
9,222,430'Multicore processor and onboard electronic control unit using same'20157,089,149'Method and apparatus for detecting an angle of a rotating shaft'20066,646,275'Charged particle beam exposure system and method'20036,486,479'Charged particle beam exposure system and method'20026,433,716'Data conversion device having mediator for determining data conversion order'20026,188,074'Charged particle beam exposure apparatus'20016,118,129'Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements'20006,072,185'Charged-particle-beam exposure device and method capable of high-speed data reading'20006,064,807'Charged-particle beam exposure system and method'20006,057,907'Method of and system for exposing pattern on object by charged particle beam'20005,977,548'Charged particle beam exposure system and method'19995,965,895'Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure'19995,920,077'Charged particle beam exposure system'19995,910,658'Method and system for changed particle beam exposure'19995,866,300'Method of and system for exposing pattern on object by charged particle beam'19995,841,145'Method of and system for exposing pattern on object by charged particle beam'19985,721,432'Method of and system for charged particle beam exposure'19985,719,402'Method of and system for charged particle beam exposure'19985,614,725'Charged particle beam exposure system and method'19975,546,319'Method of and system for charged particle beam exposure'19965,528,048'Charged particle beam exposure system and method'19965,401,974'Charged particle beam exposure apparatus and method of cleaning the same'19955,399,872'Charged-particle beam exposure method'19955,369,282'Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2003Patents assigned to FUJITSU LTD (20)· patent assignee history
1994–2003Based in Kawasaki, JP· patent location history
1999–2001Patents assigned to ADVANTEST CORP (2)· patent assignee history
2001Based in Tokyo, JP· patent location history
2002–2015Patents assigned to DENSO CORP (3)· patent assignee history
2002Based in Kariya, JP· patent location history
2006–2015Based in Okazaki, JP· patent location history
2015Patents assigned to ARAI SOICHIRO (1)· patent assignee history
2015Patents assigned to TOYOTA MOTOR CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 20 | 1994–2003 |
| DENSO CORP | 3 | 2002–2015 |
| ADVANTEST CORP | 2 | 1999–2001 |
| ARAI SOICHIROself | 1 | 2015 |
| TOYOTA MOTOR CO LTD | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 20 | 1994–2003 |
| Okazaki, JP | 2 | 2006–2015 |
| Kariya, JP | 1 | 2002 |
| Tokyo, JP | 1 | 2001 |