Inventor
Masayuki Sanada
Inventor
Niigata, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H02Kprimary
H02KDynamo-electric machines33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G06FElectric digital data processing17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
9,800,106'Rotor'20178,653,713'Magnetic circuit structure'20148,462,499'Information processing apparatus'20136,066,579'Hydrogen heat treatment method of silicon wafers using a high-purity inert substitution gas'20005,744,401'Silicon wafer manufacturing method eliminating final mirror-polishing step'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2000Patents assigned to TOSHIBA CERAMICS CO (2)· patent assignee history
1998–2000Based in Niigata, JP· patent location history
2013–2014Patents assigned to SANADA MASAYUKI (2)· patent assignee history
2013Based in Hamura, JP· patent location history
2014–2017Patents assigned to UNIV OSAKA PREFECT PUBLIC CORP (2)· patent assignee history
2014Patents assigned to MORIMOTO SHIGEO (1)· patent assignee history
2014Based in Sakai, JP· patent location history
2017Patents assigned to DAIKIN IND LTD (1)· patent assignee history
2017Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SANADA MASAYUKIself | 2 | 2013–2014 |
| TOSHIBA CERAMICS CO | 2 | 1998–2000 |
| UNIV OSAKA PREFECT PUBLIC CORP | 2 | 2014–2017 |
| DAIKIN IND LTD | 1 | 2017 |
| MORIMOTO SHIGEO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Niigata, JP | 2 | 1998–2000 |
| Osaka, JP | 1 | 2017 |
| Sakai, JP | 1 | 2014 |
| Hamura, JP | 1 | 2013 |