Inventor
Raman Viswanathan
Inventor
Briarcliff Manor, NY, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G01VGeophysics17%
H10DInorganic electric semiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
E21BEarth or rock drilling7%
G06FElectric digital data processing7%
Y10TTechnical subjects covered by former us classification7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
PatentTitleYear
10,365,402Telemetry method and system for subsurface well and reservoir logging data20199,664,815'Telemetry method and system for subsurface well and reservoir and logging data'20178,581,742'Bandwidth wireline data transmission system and method'20138,023,690'Apparatus and method for imaging fluids downhole'20117,767,385'Method for lithography for optimizing process conditions'20107,659,050'High resolution silicon-containing resist'20107,399,573'Method for using negative tone silicon-containing resist for e-beam lithography'20086,440,639'High-aspect ratio resist development using safe-solvent mixtures of alcohol and water'20026,316,123'Microwave annealing'20016,172,399'Formation of ultra-shallow semiconductor junction using microwave annealing'20016,051,283'Microwave annealing'20006,051,483'Formation of ultra-shallow semiconductor junction using microwave annealing'20006,009,143'Mirror for providing selective exposure in X-ray lithography'19995,781,607'Membrane mask structure, fabrication and use'19985,051,598'Method for correcting proximity effects in electron beam lithography'19914,556,884'Depth dependent multiple logging system'19854,346,593'Well logging correction method and apparatus'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982–1985Patents assigned to DRESSER IND (2)· patent assignee history
1982–2019Based in Houston, TX, US· patent location history
1991–2010Patents assigned to IBM (11)· patent assignee history
1991–2010Based in Briarcliff Manor, NY, US· patent location history
2011–2019Patents assigned to BAKER HUGHES INC (4)· patent assignee history
2013–2017Patents assigned to VISWANATHAN RAMAN (2)· patent assignee history
2017Patents assigned to ANDRADE HAROLD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 11 | 1991–2010 |
| BAKER HUGHES INC | 4 | 2011–2019 |
| DRESSER IND | 2 | 1982–1985 |
| VISWANATHAN RAMANself | 2 | 2013–2017 |
| ANDRADE HAROLD | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Briarcliff Manor, New York, US | 11 | 1991–2010 |
| Houston, Texas, US | 6 | 1982–2019 |