Inventor
Yoshihiro Shirota
Inventor
Annaka, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry19%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium10%
H02HEmergency protective circuit arrangements10%
G01RMeasuring electric variables6%
H02JElectric power networks6%
Y02PClimate change mitigation technologies in the production or processing of goods6%
B22FWorking metallic powder3%
C07CAcyclic or carbocyclic compounds3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
PatentTitleYear
RE040037'Electric power system protection and control system'20086,741,916'Accident point locating system'20046,686,312'Metallic copper catalyst and process for making organohalosilanes'20046,632,956'Preparation of diorganodichlorosilane'20036,618,648'Control system method of protectively controlling electric power system and storage medium storing program code'20036,365,766'Metallic copper catalyst and process for the synthesis of organohalosilanes'20026,225,490'Continuous hydrolysis of organochlorosilanes'20015,917,099'Preparation of methyl chloride'19995,618,497'Polymerization apparatus effective in preventing polymer scale deposition'19975,610,245'Polymerization method producing vinyl chloride polymer'19975,447,999'Vinyl chloride polymerization with recycle return projecting into gas phase region of reactor'19955,210,158'Suspension polymerization of vinyl chloride with heating of reactor surfaces'19934,229,568'Method of discharging gaseous vinyl chloride monomer from a polymerization reactor'19804,092,471'Method for removing unreacted monomers from aqueous dispersions of polymerizate'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–2004Patents assigned to SHINETSU CHEMICAL CO (11)· patent assignee history
1993Based in Gunma, JP· patent location history
1995–1997Based in Maebashi, JP· patent location history
1999–2004Based in Annaka, JP· patent location history
2003–2008Patents assigned to TOSHIBA KK (3)· patent assignee history
2003–2008Based in Tokyo, JP· patent location history
2003–2004Based in Takasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 11 | 1978–2004 |
| TOSHIBA KK | 3 | 2003–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Annaka, JP | 4 | 1999–2004 |
| Maebashi, JP | 3 | 1995–1997 |
| Tokyo, JP | 2 | 2003–2008 |
| Takasaki, JP | 2 | 2003–2004 |
| Gunma, JP | 1 | 1993 |