Inventor

Xun GU

Inventor
US

Overview

6→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus16%
B22FWorking metallic powder11%
B82YSpecific uses or applications of nanostructures11%
G01RMeasuring electric variables11%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering5%
C22CAlloys5%
C23FNon-mechanical removal of metallic material from surface5%
C25FProcesses for the electrolytic removal of materials from objects5%
G01CMeasuring distances, levels or bearings5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to HITACHI ENERGY SWITZERLAND AG (1)· patent assignee history
2021–2024Based in CH· patent location history
2023Patents assigned to BOE TECHNOLOGY GROUP CO LTD (2)· patent assignee history
2023Patents assigned to HEFEI BOE OPTOELECTRONICS TECH (2)· patent assignee history
2023Based in CN· patent location history
2024–2025Patents assigned to UNIV LELAND STANFORD JUNIOR (2)· patent assignee history
2024Patents assigned to HITACHI ENERGY LTD (1)· patent assignee history
2024–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BOE TECHNOLOGY GROUP CO LTD22023
HEFEI BOE OPTOELECTRONICS TECH22023
UNIV LELAND STANFORD JUNIOR22024–2025
HITACHI ENERGY LTD12024
HITACHI ENERGY SWITZERLAND AG12021
Locations
LocationPatentsSpan
US22024–2025
CH22021–2024
CN22023