Inventor
Pei-Yu Chou
Inventor
Tainan, TW
Overview
Patents· 37 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10DInorganic electric semiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1023%
H01LSemiconductor devices10%
A47FSpecial furniture, fittings, or accessories for shops, storehouses, bars, restaurants or the like1%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems1%
B82YSpecific uses or applications of nanostructures1%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%
G06FElectric digital data processing1%
G06KGraphical data reading1%
PatentTitleYear
11,023,697Object storing apparatus and object access method202110,763,328Epitaxial semiconductor material grown with enhanced local isotropy202010,714,586Semiconductor device and a method for fabricating the same202010,153,351Semiconductor device and a method for fabricating the same20189,741,625'Method of forming a semiconductor device with STI structures on an SOI substrate'20179,502,530'Method of manufacturing semiconductor devices'20169,214,395'Method of manufacturing semiconductor devices'20158,829,575'Semiconductor structure and process thereof'20148,828,815'Method for fabricating strained-silicon CMOS transistor'20148,772,120'Semiconductor process'20148,753,902'Method of controlling etching process for forming epitaxial structure'20148,673,544'Method of forming openings'20148,592,322'Method of fabricating openings'20138,574,990'Method of manufacturing semiconductor device having metal gate'20138,461,649'Opening structure for semiconductor device'20138,324,038'Method of removing a spacer, method of manufacturing a metal-oxide-semiconductor transistor device, and metal-oxide-semiconductor transistor device'20128,310,012'Semiconductor device having metal gate and manufacturing method thereof'20128,293,639'Method for controlling ADI-AEI CD difference ratio of openings having different sizes'20128,236,702'Method of fabricating openings and contact holes'20128,168,374'Method of forming a contact hole'20128,164,141'Opening structure with sidewall of an opening covered with a dielectric thin film'20128,101,092'Method for controlling ADI-AEI CD difference ratio of openings having different sizes'20127,868,390'Method for fabricating strained-silicon CMOS transistor'20117,846,345'Method of manufacturing an imprinting template using a semiconductor manufacturing process and the imprinting template obtained'20107,829,472'Method of forming at least an opening using a tri-layer structure'20107,799,511'Method of forming a contact hole'20107,615,434'CMOS device and fabricating method thereof'20097,601,587'Fabricating method of CMOS'20097,544,623'Method for fabricating a contact hole'20097,524,742'Structure of metal interconnect and fabrication method thereof'20097,517,766'Method of removing a spacer, method of manufacturing a metal-oxide-semiconductor transistor device, and metal-oxide-semiconductor transistor device'20097,432,194'Etching method and method for forming contact opening'20087,378,341'Automatic process control of after-etch-inspection critical dimension'20087,365,009'Structure of metal interconnect and fabrication method thereof'20087,319,067'Method of simultaneously controlling ADI-AEI CD differences of openings having different sizes and etching process utilizing the same method'20087,319,074'Method of defining polysilicon patterns'20087,195,716'Etching process and patterning process'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2016Patents assigned to UNITED MICROELECTRONICS CORP (32)· patent assignee history
2007–2021Based in Taipei, TW· patent location history
2009–2016Based in Tainan, TW· patent location history
2012–2014Patents assigned to CHOU PEI-YU (13)· patent assignee history
2012–2014Patents assigned to LIAO JIUNN-HSIUNG (12)· patent assignee history
2012–2013Patents assigned to FENG CHIH-WEN (6)· patent assignee history
2012–2013Patents assigned to LIN YING-CHIH (6)· patent assignee history
2017–2020Based in Dresden, DE· patent location history
2018Based in Hsinchu, TW· patent location history
2020Based in Hsinchu County, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 32 | 2007–2016 |
| CHOU PEI-YUself | 13 | 2012–2014 |
| LIAO JIUNN-HSIUNG | 12 | 2012–2014 |
| FENG CHIH-WEN | 6 | 2012–2013 |
| LIN YING-CHIH | 6 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 22 | 2009–2016 |
| Taipei, TW | 9 | 2007–2021 |
| Dresden, DE | 2 | 2017–2020 |
| Hsinchu County, TW | 1 | 2020 |
| Hsinchu, TW | 1 | 2018 |