Inventor
Shin-ya Minegishi
Inventor
Tokyo, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
C08LCompositions of macromolecular compounds11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
H01LSemiconductor devices9%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
B44CProducing decorative effects5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
PatentTitleYear
10,025,188Resist pattern-forming method20189,447,303'Composition for forming resist underlayer film'20169,329,478'Polysiloxane composition and pattern-forming method'20169,170,493'Resist underlayer film-forming composition, pattern-forming method and resist underlayer film'20159,134,611'Composition for forming resist underlayer film and pattern-forming method'20159,090,119'Pattern forming method'20159,040,232'Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film'20159,029,069'Resist underlayer film-forming composition and method for forming pattern'20158,993,223'Resist pattern-forming method'20158,871,432'Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film'20148,859,185'Resist underlayer film-forming composition'20148,715,916'Pattern forming method and resist underlayer film-forming composition'20148,669,042'Resist pattern-forming method'20148,513,133'Composition for forming resist underlayer film and method for forming pattern'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2018Patents assigned to JSR CORP (14)· patent assignee history
2013–2015Patents assigned to MINEGISHI SHIN-YA (5)· patent assignee history
2013–2015Patents assigned to MURAKAMI SATORU (3)· patent assignee history
2013–2015Patents assigned to NAKANO TAKANORI (3)· patent assignee history
2013–2015Patents assigned to KOMURA KAZUHIKO (2)· patent assignee history
2013–2018Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 14 | 2013–2018 |
| MINEGISHI SHIN-YAself | 5 | 2013–2015 |
| MURAKAMI SATORU | 3 | 2013–2015 |
| NAKANO TAKANORI | 3 | 2013–2015 |
| KOMURA KAZUHIKO | 2 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 2013–2018 |