Inventor
Marie-Claire VAN LARE
Inventor
NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
G06NComputing arrangements based on specific computational models9%
G06TImage data processing or generation, in general9%
G06VImage or video recognition or understanding9%
H01JElectric discharge tubes or discharge lamps9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
PatentTitleYear
12,586,170System and method for generating predictive images for wafer inspection using machine learning202612,386,268Method for calibrating simulation process based on defect-based process window202512,321,101Method for applying a deposition model in a semiconductor manufacturing process202512,197,120Patterning device and method of use thereof202511,892,776Imaging via zeroth order suppression2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2024–2026Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 5 | 2024–2026 |