Inventor
TETSUYA KAMIMURA
Inventor
JP
Overview
Patents· 71 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H01LSemiconductor devices16%
C11DDetergent compositions9%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers6%
B01DSeparation5%
C09GPolishing compositions3%
B24BMachines, devices, or processes for grinding or polishing3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds2%
PatentTitleYear
12,588,450Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound202612,572,070Chemical liquid, resist pattern forming method, semiconductor chip manufacturing method, chemical liquid storage body, and chemical liquid manufacturing method202612,559,301Member, container, chemical liquid storage body, reactor, distillation column, filter unit, storage tank, pipe line, and chemical liquid manufacturing method202612,554,201Liquid chemical and method for producing liquid chemical202612,480,072Cleaning fluid and cleaning method202512,481,218Treatment liquid, method for washing substrate, and method for removing resist202512,454,405Chemical liquid and chemical liquid storage body202512,448,541Polishing liquid and chemical mechanical polishing method202512,434,997Chemical liquid storage body202512,436,461Chemical liquid, pattern forming method, and kit202512,386,265Pattern forming method and method for manufacturing electronic device202512,372,868Pattern forming method, kit, and resist composition202512,372,873Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the same202512,374,540Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture202512,366,805Chemical liquid, rinsing solution, and resist pattern forming method202512,343,681Filter device, purification device, chemical solution production method202512,311,294Chemical liquid purification method and chemical liquid202512,313,976Storage container storing treatment liquid for manufacturing semiconductor202512,282,259Liquid chemical, method for producing liquid chemical, and method for analyzing test target solution202512,276,915Treatment liquid and treatment method202512,253,801Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device202512,247,300Cleaning solution and cleaning method202512,235,584Chemical liquid, chemical liquid storage body, resist pattern forming method, and semiconductor chip manufacturing method202512,228,857Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device202512,210,287Resist pattern forming method and semiconductor chip manufacturing method202512,188,901Management method, measuring method, measuring device, crystal oscillator sensor, and set202512,169,362Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage method202412,161,973Filtering device, purification device, and method for manufacturing chemical liquid202412,097,996Container, method for manufacturing container, and chemical liquid storage body202412,098,301Polishing liquid and chemical mechanical polishing method202412,030,713Chemical liquid and chemical liquid storage body202412,012,658Composition, kit, and method for treating substrate202412,013,644Method for manufacturing electronic device202412,006,446Polishing liquid and chemical mechanical polishing method202411,981,882Chemical liquid and chemical liquid storage body202411,976,001Chemical liquid storage body202411,958,005Chemical liquid purification method and chemical liquid202411,914,300Manufacturing method of semiconductor chip, and kit202411,899,369Treatment liquid, method for washing substrate, and method for removing resist202411,892,775Storage container storing treatment liquid for manufacturing semiconductor202411,878,274Filtering device, purification device, and method for manufacturing chemical liquid202411,833,475Filtering device, purification device, and method for manufacturing chemical liquid202311,759,749Filtering device, purification device, and method for manufacturing chemical liquid202311,747,727Chemical liquid, chemical liquid storage body, pattern forming method, and kit202311,745,142Filter device, purification device, chemical solution production method202311,740,557Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage method202311,733,611Pattern forming method, method for producing electronic device, and kit202311,693,321Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device202311,666,864Filtering device, purification device, and method for manufacturing chemical liquid202311,573,489Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device202311,559,758Filtering device, purification device, chemical liquid manufacturing device, filtered substance to be purified, chemical liquid, and actinic ray-sensitive or radiation-sensitive resin composition202311,541,354Filtration device, refining device, and production method for liquid medicine202311,491,428Chemical liquid purification method and chemical liquid202211,480,880Treatment liquid, method of manufacturing treatment liquid, pattern forming method, and method of manufacturing electronic device202211,465,073Chemical liquid purification method, chemical liquid manufacturing method, and chemical liquid202211,453,734Treatment liquid and pattern forming method202211,410,859Treatment liquid202211,401,442Polishing liquid and chemical mechanical polishing method202211,397,383Treatment liquid, method for washing substrate, and method for removing resist202211,392,046Quality inspection method for chemical liquid202211,372,331Treatment liquid for manufacturing semiconductor, method of manufacturing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device202211,360,389Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage method202211,359,113Polishing liquid and chemical mechanical polishing method202211,351,503Chemical liquid purification method202211,326,048Member, container, chemical liquid storage body, chemical liquid purification device, and manufacturing tank202211,267,989Polishing liquid and chemical mechanical polishing method202211,267,988Polishing liquid and chemical mechanical polishing method202211,256,173Treatment liquid for manufacturing semiconductor and pattern forming method202211,225,633Treatment liquid, method for washing substrate, and method for removing resist202211,192,786Composition, composition reservoir, and method for producing composition202111,175,585Treatment liquid and treatment liquid housing body2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to FUJIFILM CORP (71)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 71 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 71 | 2021–2026 |