Inventor
Franz Cemic
Inventor
Weilmuenster, DE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus40%
G01BMeasuring length, thickness or similar linear dimensions30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
PatentTitleYear
7,271,889'Device and method for inspecting an object'20077,209,243'Illumination device, and coordinate measuring instrument having an illumination device'20076,975,409'Illumination device; and coordinate measuring instrument having an illumination device'20056,943,901'Critical dimension measuring instrument'20056,879,440'Autofocus module and method for a microscope-based system'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2007Patents assigned to LEICA MICROSYSTEMS (5)· patent assignee history
2005–2007Based in Weilmuenster, DE· patent location history
2007Based in Weilmünster, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LEICA MICROSYSTEMS | 5 | 2005–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Weilmuenster, DE | 4 | 2005–2007 |
| Weilmünster, DE | 1 | 2007 |