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Inventor

Keisuke Katou

Inventor
Yokohama, JP

Overview

3→
Patents
2015–2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C08LCompositions of macromolecular compounds22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
9,296,842'Polymer for lithography'20169,109,060'Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate'20159,023,578'Copolymer for lithography and method for evaluating the same'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2016Patents assigned to MITSUBISHI RAYON CO (3)· patent assignee history
2015Patents assigned to KATOU KEISUKE (2)· patent assignee history
2015Patents assigned to MAEDA SHINICHI (2)· patent assignee history
2015Patents assigned to MATSUMOTO DAISUKE (2)· patent assignee history
2015Patents assigned to OSHIKIRI TOMOYA (1)· patent assignee history
2015–2016Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI RAYON CO32015–2016
KATOU KEISUKEself22015
MAEDA SHINICHI22015
MATSUMOTO DAISUKE22015
OSHIKIRI TOMOYA12015
Locations
LocationPatentsSpan
Yokohama, JP32015–2016