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Inventor

WATARU NAGATOMO

Inventor
JP

Overview

3→
Patents
2023–2026
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Tprimary
G06TImage data processing or generation, in general21%
G06VImage or video recognition or understanding21%
H01JElectric discharge tubes or discharge lamps21%
G01BMeasuring length, thickness or similar linear dimensions14%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G06NComputing arrangements based on specific computational models7%
PatentTitleYear
12,579,778Pattern matching device, pattern measuring system, pattern matching program202612,412,275Pattern matching device, pattern measurement system, and non-transitory computer-readable medium202511,669,953Pattern matching device and computer program for pattern matching2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2026Patents assigned to HITACHI HIGH TECH CORP (3)· patent assignee history
2023–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP32023–2026
Locations
LocationPatentsSpan
JP32023–2026