Inventor

Eric Hendrickx

Inventor

Linden, BE

Overview

5→

Patents

2000–2013

Patent span

Physics

Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein20%

G11BInformation storage based on relative movement between record carrier and transducer20%

G11CStatic stores20%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%

PatentTitleYear

8,510,686'Inverse lithography for high transmission attenuated phase shift mask design and creation'2013 7,761,837'Method of making alternating phase shift masks'2010 7,466,413'Marker structure, mask pattern, alignment method and lithographic method and apparatus'2008 6,402,994'Thermally stable molecules with large dipole moments and polarizabilities and applications thereof'2002 6,090,332'Process of changing the refractive index of a composite containing a polymer and a compound having large dipole moment and polarizability and applications thereof'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2002Patents assigned to CALIFORNIA INST OF TECHN (2)· patent assignee history

2000–2002Based in Glabbeek, BE· patent location history

2008Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

2008–2010Based in Linden, BE· patent location history

2010–2013Patents assigned to IMEC (2)· patent assignee history

2013Patents assigned to HENDRICKX ERIC HENRI JAN (1)· patent assignee history

2013Patents assigned to SAKAJIRI KYOHEI (1)· patent assignee history

2013Based in Lubbeck, BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CALIFORNIA INST OF TECHN	2	2000–2002
IMEC	2	2010–2013
ASML NETHERLANDS BV	1	2008
HENDRICKX ERIC HENRI JANself	1	2013
SAKAJIRI KYOHEI	1	2013

Locations

Location	Patents	Span
Linden, BE	2	2008–2010
Glabbeek, BE	2	2000–2002
Lubbeck, BE	1	2013