Inventor
Edo Maria Hulsebos
Inventor
Waalre, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices71%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
G05BControl or regulating systems in general5%
G06FElectric digital data processing5%
G06NComputing arrangements based on specific computational models5%
Y02PClimate change mitigation technologies in the production or processing of goods5%
PatentTitleYear
11,086,305Determining a correction to a process202111,079,684Measurement apparatus and a method for determining a substrate grid202111,029,610Lithographic method202110,962,887Lithographic method202110,901,326Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202110,620,549Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202010,527,958Lithographic method202010,527,957Method and apparatus for processing a substrate in a lithographic apparatus202010,514,620Alignment method201910,474,045Lithographic apparatus and device manufacturing method201910,331,040Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus201910,139,740Lithographic apparatus and device manufacturing method20189,665,012'Lithographic apparatus and device manufacturing method'20178,208,139'Alignment system and alignment marks for use therewith'20128,208,140'Alignment system and alignment marks for use therewith'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to ASML NETHERLANDS BV (15)· patent assignee history
2012Patents assigned to BIJNEN FRANCISCUS GODEFRIDUS CASPER (2)· patent assignee history
2012Patents assigned to HULSEBOS EDO MARIA (2)· patent assignee history
2012Patents assigned to WARNAAR PATRICK (2)· patent assignee history
2012Based in 's-Hertogenbosch, NL· patent location history
2017–2021Based in Waalre, NL· patent location history
2018Based in Waarle, NL· patent location history
2019Patents assigned to ASML HOLDING NV (1)· patent assignee history
2021Based in Bergeijk, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 15 | 2012–2021 |
| BIJNEN FRANCISCUS GODEFRIDUS CASPER | 2 | 2012 |
| HULSEBOS EDO MARIAself | 2 | 2012 |
| WARNAAR PATRICK | 2 | 2012 |
| ASML HOLDING NV | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Waalre, NL | 11 | 2017–2021 |
| 's-Hertogenbosch, NL | 2 | 2012 |
| Bergeijk, NL | 1 | 2021 |
| Waarle, NL | 1 | 2018 |