Inventor
Roderick Köhle
Inventor
Ottobrunn, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
H04NPictorial communication, e.g. television25%
PatentTitleYear
10,462,447Electronic system including image processing unit for reconstructing 3D surfaces and iterative triangulation method20197,393,614'Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer'20087,354,683'Lithography mask for imaging of convex structures'20087,328,424'Method for determining a matrix of transmission cross coefficients in an optical proximity correction of mask layouts'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008Patents assigned to INFINEON TECHNOLOGIES AG (3)· patent assignee history
2008Based in Ottobrunn, DE· patent location history
2019Patents assigned to SONY CORP (1)· patent assignee history
2019Based in Munich, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 3 | 2008 |
| SONY CORP | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ottobrunn, DE | 3 | 2008 |
| Munich, DE | 1 | 2019 |