Inventor

Yutaka Suenaga

Inventor

Yokohama, JP

Overview

1986–2013

Patent span

Physics

Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary

G02BOptical elements, systems or apparatus53%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h101%

PatentTitleYear

8,351,116'Optical component and phase contrast microscope using optical component'2013 7,079,314'Catadioptric optical system and exposure apparatus equipped with the same'2006 6,856,377'Relay image optical system, and illuminating optical device and exposure system provided with the optical system'2005 6,844,919'Projection optical system and exposure apparatus having the projection optical system'2005 6,707,601'Exposure apparatus and method'2004 RE038403'Projection optical system and projection exposure apparatus'2004 6,646,797'Exposure apparatus and method'2003 6,633,365'Projection optical system and exposure apparatus having the projection optical system'2003 6,451,507'Exposure apparatus and method'2002 6,452,723'Exposure apparatus and method'2002 RE037846'Projection optical system and exposure apparatus using the same'2002 6,377,338'Exposure apparatus and method'2002 6,302,548'Catoptric reduction projection optical system and exposure apparatus and method using same'2001 6,259,557'Device and method for dark field illumination'2001 6,213,610'Catoptric reduction projection optical system and exposure apparatus and method using same'2001 6,118,596'Catadioptric reduction projection optical system and method'2000 6,108,140'Catadioptric reduction projection optical system and method'2000 6,084,723'Exposure apparatus'2000 RE036740'Cata-dioptric reduction projection optical system'2000 5,978,155'Adapters for correcting spherical aberrations of objective lens'1999 5,943,172'Projection optical system and projection exposure apparatus'1999 5,940,220'Microscope objective lens with variable correction of aberrations imparted by transparent body between the specimen and the objective lens'1999 5,930,049'Projection optical system and method of using such system for manufacturing devices'1999 5,920,432'Microscope objective lens'1999 5,889,617'Objective lens systems'1999 5,844,728'Catadioptric reduction projection optical system'1998 5,835,285'Projection optical system and exposure apparatus using the same'1998 5,835,282'Zoom lens system'1998 5,831,770'Projection optical system and exposure apparatus provided therewith'1998 5,831,776'Projection optical system and projection exposure apparatus'1998 5,805,344'Projection optical system and projection exposure apparatus'1998 5,781,278'Projection optical system and exposure apparatus with the same'1998 5,751,486'Shake-preventing correction optical system'1998 5,712,735'Catadioptric reduction projection optical system'1998 5,708,531'Objective lens system'1998 5,694,241'Catadioptric reduction projection optical system and exposure apparatus employing the same'1997 5,668,673'Catadioptric reduction projection optical system'1997 5,592,329'Catadioptric optical system'1997 5,589,988'Retrofocus-type wide angle lens system having a fixed front lens group and a movable rear lens group'1996 5,532,878'Objective lens system for microscope'1996 5,477,388'Inverse telescopic wide angle lens'1995 5,220,454'Cata-dioptric reduction projection optical system'1993 4,798,962'Multi-wavelength projection exposure and alignment apparatus'1989 4,795,244'Projection type exposure apparatus'1989 4,723,845'Optical apparatus for the detection of position'1988 4,626,079'Dark field illumination apparatus for epi-illumination system'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–2004Patents assigned to NIPPON KOGAKU KK (5)· patent assignee history

1986–2006Based in Yokohama, JP· patent location history

1988–1989Based in Kawasaki, JP· patent location history

1989–2006Patents assigned to NIKON CORP (39)· patent assignee history

2000–2005Based in Tokyo, JP· patent location history

2013Patents assigned to SUENAGA YUTAKA (1)· patent assignee history

2013Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	39	1989–2006
NIPPON KOGAKU KK	5	1986–2004
SUENAGA YUTAKAself	1	2013

Locations

Location	Patents	Span
Yokohama, JP	40	1986–2006
Kawasaki, JP	3	1988–1989
Tokyo, JP	2	2000–2005
Kanagawa, JP	1	2013