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Inventor

Shing Y. Wang

Inventor
Hsinchu, TW

Overview

2→
Patents
1993–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
10,915,027Post development treatment method and material for shrinking critical dimension of photoresist layer20215,227,564'Process for the preparation of tertiary olefins'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993Patents assigned to DAIREN CHEMICAL CORP (1)· patent assignee history
1993Based in Kaohsiung, TW· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAIREN CHEMICAL CORP11993
TAIWAN SEMICONDUCTOR MFG CO LTD12021
Locations
LocationPatentsSpan
Hsinchu, TW12021
Kaohsiung, TW11993