Inventor
KENICHI OIKAWA
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
C07CAcyclic or carbocyclic compounds19%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%
C07DHeterocyclic compounds14%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution10%
C08LCompositions of macromolecular compounds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
PatentTitleYear
12,072,627Resist composition and patterning process202412,050,402Resist composition and patterning process202411,762,287Onium salt compound, chemically amplified resist composition and patterning process202311,693,314Resist composition and patterning process202311,662,663Substrate protective film-forming composition and pattern forming process202311,448,962Resist composition and patterning process2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
2022–2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 6 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2022–2024 |