Inventor
Zhigang Wu
Inventor
Yokohama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
G06FElectric digital data processing13%
B82YSpecific uses or applications of nanostructures11%
H01JElectric discharge tubes or discharge lamps11%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H04LTransmission of digital information, e.g. telegraphic communication5%
A61BDiagnosis3%
B01LChemical or physical laboratory apparatus for general use3%
B29CShaping or joining of plastics3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
PatentTitleYear
10,931,436Detector circuit and operation method202110,746,832DTI with correction of motion-induced diffusion gradient inconsistency202010,487,349Use of a fluidic device201910,348,890Information pushing method and apparatus, and terminal and server201910,315,351Apparatus and method for improving production efficiency of crystallizer bottleneck cooling20199,612,049'Sensor mount for a mobile refrigeration system'20178,536,361'1,4,6,10-tetra-double bond pentadec-carbon phosphonate, preparation method thereof, and preparation method of lycopene using the same'20138,533,640'Method and system for stencil design for particle beam writing'20138,525,135'System and method of electron beam writing'20137,953,582'Method and system for lithography simulation and measurement of critical dimensions'20117,820,399'Methods for characterizing glycosylation sites'20107,777,204'System and method of electron beam writing'20107,747,977'Method and system for stencil design for particle beam writing'20107,351,954'Method and apparatus for detecting gas concentration with infrared absorption characteristics'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2013Patents assigned to CADENCE DESIGN SYSTEMS INC (3)· patent assignee history
2010–2013Patents assigned to D2S INC (2)· patent assignee history
2010–2013Based in Yokohama, JP· patent location history
2010–2013Based in Kanagawa, JP· patent location history
2013–2017Patents assigned to WU ZHIGANG (4)· patent assignee history
2013Patents assigned to MATSUSHITA SHOHEI (2)· patent assignee history
2013Patents assigned to MITSUHASHI TAKASHI (2)· patent assignee history
2017–2020Based in Suzhou, CN· patent location history
2019Based in Uppsala, SE· patent location history
2021Based in Zhubei City, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| WU ZHIGANGself | 4 | 2013–2017 |
| CADENCE DESIGN SYSTEMS INC | 3 | 2010–2013 |
| D2S INC | 2 | 2010–2013 |
| MATSUSHITA SHOHEI | 2 | 2013 |
| MITSUHASHI TAKASHI | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 3 | 2010–2013 |
| Suzhou, CN | 2 | 2017–2020 |
| Kanagawa, JP | 2 | 2010–2013 |
| Zhubei City, TW | 1 | 2021 |
| Uppsala, SE | 1 | 2019 |