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Inventor

SAJO NAIK

Inventor
US

Overview

2→
Patents
2024–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B24BMachines, devices, or processes for grinding or polishing14%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
H01LSemiconductor devices14%
PatentTitleYear
12,528,973Composition and method for silicon oxide and carbon doped silicon oxide CMP202612,116,502Self-stopping polishing composition and method for high topological selectivity2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to CMC MAT INC (2)· patent assignee history
2024–2026Patents assigned to CMC MAT LLC (2)· patent assignee history
2024–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CMC MAT INC22024–2026
CMC MAT LLC22024–2026
Locations
LocationPatentsSpan
US22024–2026