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Inventor

Kangsheng QIU

Inventor
US

Overview

2→
Patents
2024–2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,560,556Method and system of sample edge detection and sample positioning for image inspection apparatus202612,051,562Method, apparatus, and system for wafer grounding2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2024–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22024–2026
Locations
LocationPatentsSpan
US22024–2026