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Inventor

Toshiyuki Marumo

Inventor
Asaka, JP

Overview

1→
Patents
2006
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,037,627'Photomask defect testing method, photomask manufacturing method and semiconductor integrated circuit manufacturing method'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006Patents assigned to TOPPAN PRINTING CO LTD (1)· patent assignee history
2006Based in Asaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOPPAN PRINTING CO LTD12006
Locations
LocationPatentsSpan
Asaka, JP12006