Inventor
Richard Quintanilha
Inventor
Eindhoven, NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
G01NInvestigating or analysing materials by determining their chemical or physical properties24%
G01BMeasuring length, thickness or similar linear dimensions7%
G02BOptical elements, systems or apparatus7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H05GX-ray technique7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H01LSemiconductor devices4%
G06KGraphical data reading2%
PatentTitleYear
10,976,265Optical detector202110,634,490Determining edge roughness parameters202010,555,407Metrology methods, radiation source, metrology apparatus and device manufacturing method202010,342,108Metrology methods, radiation source, metrology apparatus and device manufacturing method201910,254,644Metrology methods, metrology apparatus and device manufacturing method201910,222,709Metrology method, metrology apparatus and device manufacturing method201910,146,140Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method201810,101,671Metrology methods, metrology apparatus and device manufacturing method201810,067,074Metrology methods, metrology apparatus and device manufacturing method201810,036,962Inspection apparatus and methods, lithographic system and device manufacturing method20189,915,879'Substrate and patterning device for use in metrology, metrology method and device manufacturing method'20189,904,181'Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method'20189,823,586'Inspection apparatus, inspection method and manufacturing method'20179,632,424'Illumination source for use in inspection methods and/or lithography; inspection and lithographic apparatus and inspection method'20179,563,131'Lithographic apparatus, substrate and device manufacturing method'20179,261,772'Lithographic apparatus, substrate and device manufacturing method'20168,876,346'Illumination source for use in inspection methods and/or lithography; inspection and lithographic apparatus and inspection method'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2021Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2014Patents assigned to QUINTANILHA RICHARD (1)· patent assignee history
2014–2021Based in Eindhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2014–2021 |
| QUINTANILHA RICHARDself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 17 | 2014–2021 |