LexDanaLexDanabeta
Inventor

Ming-Chih Yeh

Inventor
Taipei, TW

Overview

2→
Patents
2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions20%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
C23FNon-mechanical removal of metallic material from surface10%
PatentTitleYear
9,803,109'CMP composition for silicon nitride removal'20179,752,057'CMP method for suppression of titanium nitride and titanium/titanium nitride removal'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to CABOT MICROELECTRONICS CORP (2)· patent assignee history
2017Based in Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CABOT MICROELECTRONICS CORP22017
Locations
LocationPatentsSpan
Taipei, TW22017