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Inventor

Antonius Franciscus Johannes De Groot

Inventor
Someren, NL

Overview

18→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H02KDynamo-electric machines12%
H01LSemiconductor devices10%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
PatentTitleYear
10,747,125Support apparatus, lithographic apparatus and device manufacturing method202010,684,558Motor assembly, lithographic apparatus and device manufacturing method202010,228,626Movable support and lithographic apparatus201910,191,392Actuator, positioning device, lithographic apparatus, and method for manufacturing an actuator201910,120,292Support apparatus, lithographic apparatus and device manufacturing method201810,001,713Lithographic apparatus and method20189,921,494'Lithographic apparatus comprising an actuator, and method for protecting such actuator'20189,753,381'Substrate table system, lithographic apparatus and substrate table swapping method'20179,726,985'Stage system and a lithographic apparatus'20179,507,275'Support apparatus, lithographic apparatus and device manufacturing method'20169,389,518'Stage system and a lithographic apparatus'20169,182,683'Lithographic apparatus and lithographic projection method'20158,947,640'Positioning device, lithographic apparatus, positioning method and device manufacturing method'20158,932,042'Lithographic apparatus and device manufacturing method'20158,896,811'Positioning system and a method for positioning a substage with respect to a frame'20148,755,030'Lithographic apparatus and device manufacturing method'20148,736,815'Position sensor and lithographic apparatus'20148,472,010'Actuator, positioning system and lithographic apparatus'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to ASML NETHERLANDS BV (18)· patent assignee history
2013–2015Patents assigned to DE GROOT ANTONIUS FRANCISCUS JOHANNES (7)· patent assignee history
2013–2015Patents assigned to CADEE THEODORUS PETRUS MARIA (2)· patent assignee history
2013–2020Based in Someren, NL· patent location history
2014–2015Patents assigned to VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS (5)· patent assignee history
2014–2015Patents assigned to BEERENS RUUD ANTONIUS CATHARINA MARIA (2)· patent assignee history
2020Based in Lierop, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV182013–2020
DE GROOT ANTONIUS FRANCISCUS JOHANNESself72013–2015
VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS52014–2015
BEERENS RUUD ANTONIUS CATHARINA MARIA22014–2015
CADEE THEODORUS PETRUS MARIA22013–2015
Locations
LocationPatentsSpan
Someren, NL172013–2020
Lierop, NL12020