LexDanaLexDanabeta
Inventor

Huey Ming Chong

Inventor
Singapore, SG

Overview

8→
Patents
2006–2014
Patent span
Physics
Primary field (CPC G)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices88%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
8,692,380'Integrated circuit system with sub-geometry removal and method of manufacture thereof'20148,293,546'Integrated circuit system with sub-geometry removal and method of manufacture thereof'20128,057,968'Mask and method to pattern chromeless phase lithography contact hole'20118,048,588'Method and apparatus for removing radiation side lobes'20117,556,891'Method and apparatus for contact hole unit cell formation'20097,288,366'Method for dual damascene patterning with single exposure using tri-tone phase shift mask'20077,224,060'Integrated circuit with protective moat'20077,014,962'Half tone alternating phase shift masks'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2009Patents assigned to CHARTERED SEMICONDUCTOR MFG (4)· patent assignee history
2006–2014Based in Singapore, SG· patent location history
2011–2014Patents assigned to GLOBALFOUNDRIES SG PTE LTD (4)· patent assignee history
2011–2012Patents assigned to CHONG HUEY MING (2)· patent assignee history
2011–2012Patents assigned to TAN SOON YOENG (2)· patent assignee history
2012Patents assigned to CHOI BYOUNG-IL (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHARTERED SEMICONDUCTOR MFG42006–2009
GLOBALFOUNDRIES SG PTE LTD42011–2014
CHONG HUEY MINGself22011–2012
TAN SOON YOENG22011–2012
CHOI BYOUNG-IL12012
Locations
LocationPatentsSpan
Singapore, SG82006–2014