Inventor

Toshihiko Nagai

Inventor
Osaka, JP

Overview

10→
Patents
1989–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
B08BCleaning in general12%
H10DInorganic electric semiconductor devices8%
A61BDiagnosis4%
C07KPeptides4%
C11DDetergent compositions4%
C23FNon-mechanical removal of metallic material from surface4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2005Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (6)· patent assignee history
2002–2005Based in Osaka, JP· patent location history
2003Patents assigned to MITSUBISHI ELECTRIC CORP (3)· patent assignee history
2003Based in Hyogo, JP· patent location history
2007Patents assigned to EKC TECHNOLOGY K K (1)· patent assignee history
2007Based in Kanagawa, JP· patent location history
2018Patents assigned to NICHIEI IND CO LTD (1)· patent assignee history
2018Based in Fukushima, JP· patent location history
2021Patents assigned to HITACHI LTD (1)· patent assignee history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD62002–2005
MITSUBISHI ELECTRIC CORP32003
EKC TECHNOLOGY K K12007
HITACHI LTD12021
NICHIEI IND CO LTD12018
Locations
LocationPatentsSpan
Osaka, JP42002–2005
Tokyo, JP12021
Fukushima, JP12018
Kanagawa, JP12007
Hyogo, JP12003