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Inventor

Julien Beynet

Inventor
Kawasaki, JP

Overview

3→
Patents
2012–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H01LSemiconductor devices33%
C23CCoating metallic material17%
PatentTitleYear
RE047170Method of forming semiconductor patterns20189,023,737'Method for forming conformal, homogeneous dielectric film by cyclic deposition and heat treatment'20158,252,691'Method of forming semiconductor patterns'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2018Patents assigned to ASM GENITECH KOREA LTD (2)· patent assignee history
2012Patents assigned to BEYNET JULIEN (1)· patent assignee history
2012Patents assigned to INOUE NAOKI (1)· patent assignee history
2012Patents assigned to PARK HYUNG SANG (1)· patent assignee history
2012Based in Kessel-Lo, BE· patent location history
2015–2018Patents assigned to ASM IP HOLDING BV (2)· patent assignee history
2015–2018Based in Kawasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM GENITECH KOREA LTD22012–2018
ASM IP HOLDING BV22015–2018
BEYNET JULIENself12012
INOUE NAOKI12012
PARK HYUNG SANG12012
Locations
LocationPatentsSpan
Kawasaki, JP22015–2018
Kessel-Lo, BE12012