Inventor

Koutarou Takahashi

Inventor

Shizuoka, JP

Overview

2014–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds22%

C09DCoating compositions, e.g. paints, varnishes or lacquers11%

C07CAcyclic or carbocyclic compounds8%

C07DHeterocyclic compounds8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

B41CProcesses for the manufacture or reproduction of printing surfaces3%

C08JWorking-up3%

G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure3%

H01LSemiconductor devices3%

PatentTitleYear

10,996,127Pressure detection device and pressure detection system having first and second housings electrically insulated from each other2021 10,545,405Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device2020 10,526,266Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound2020 10,324,374Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound2019 10,139,727Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device2018 10,120,281Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device2018 10,011,576Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound2018 9,904,168'Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device'2018 9,316,908'Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern'2016 9,285,679'Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition'2016 8,889,339'Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks'2014 8,735,048'Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to FUJIFILM CORP (11)· patent assignee history

2014Patents assigned to TAKAHASHI KOUTAROU (2)· patent assignee history

2014Patents assigned to TSUCHIMURA TOMOTAKA (2)· patent assignee history

2014Patents assigned to YATSUO TADATERU (2)· patent assignee history

2014–2020Based in Shizuoka, JP· patent location history

2016–2018Based in Haibara-gun, JP· patent location history

2021Patents assigned to CITIZEN FINEDEVICE CO LTD (1)· patent assignee history

2021Based in Minamitsuru-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJIFILM CORP	11	2014–2020
TAKAHASHI KOUTAROUself	2	2014
TSUCHIMURA TOMOTAKA	2	2014
YATSUO TADATERU	2	2014
CITIZEN FINEDEVICE CO LTD	1	2021

Locations

Location	Patents	Span
Shizuoka, JP	9	2014–2020
Haibara-gun, JP	2	2016–2018
Minamitsuru-gun, JP	1	2021