Inventor
Hiroshi Kawaura
Inventor
Kanagawa, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Hprimary
H05HPlasma technique27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01JElectric discharge tubes or discharge lamps18%
H01LSemiconductor devices14%
C23CCoating metallic material5%
G01GWeighing5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
10,229,814Plasma processing apparatus201910,147,585Plasma processing apparatus20189,601,330'Plasma processing device, and plasma processing method'20179,343,269'Plasma processing apparatus'20168,802,567'Plasma processing method'20148,624,340'Plasma processing apparatus and method thereof'20146,030,459'Low-pressure processing device'20004,597,459'Weight detecting type sensor'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986Patents assigned to CANON KK (1)· patent assignee history
1986Based in Yokohama, JP· patent location history
2000Patents assigned to C V RESEARCH CORP (1)· patent assignee history
2000Based in Tokyo, JP· patent location history
2014–2019Patents assigned to PANASONIC CORP (5)· patent assignee history
2014Patents assigned to KAWAURA HIROSHI (1)· patent assignee history
2014–2019Based in Kanagawa, JP· patent location history
2016–2019Patents assigned to PANASONIC IP MAN CO LTD (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PANASONIC CORP | 5 | 2014–2019 |
| PANASONIC IP MAN CO LTD | 4 | 2016–2019 |
| C V RESEARCH CORP | 1 | 2000 |
| CANON KK | 1 | 1986 |
| KAWAURA HIROSHIself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 6 | 2014–2019 |
| Tokyo, JP | 1 | 2000 |
| Yokohama, JP | 1 | 1986 |