Inventor
Nobuhiko Nishide
Inventor
Kyoto, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
H01LSemiconductor devices33%
H05BElectric heating17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
PatentTitleYear
11,081,409Heat treatment apparatus of light irradiation type and heat treatment method202110,903,095Heat treatment apparatus of light irradiation type202110,475,674Light irradiation type heat treatment apparatus and method for manufacturing heat treatment apparatus20199,831,108Thermal processing apparatus and thermal processing method for heating substrate by light irradiation20179,351,341'Heat treatment apparatus for heating substrate by irradiating substrate with flash of light'20168,262,799'Substrate processing apparatus and substrate transferring method'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2017Patents assigned to DAINIPPON SCREEN MFG (3)· patent assignee history
2012Patents assigned to NISHIDE NOBUHIKO (1)· patent assignee history
2012–2021Based in Kyoto, JP· patent location history
2016–2021Patents assigned to SCREEN HOLDINGS CO LTD (5)· patent assignee history
2021Based in Kyoto-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SCREEN HOLDINGS CO LTD | 5 | 2016–2021 |
| DAINIPPON SCREEN MFG | 3 | 2012–2017 |
| NISHIDE NOBUHIKOself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 5 | 2012–2021 |
| Kyoto-shi, JP | 1 | 2021 |