Inventor

Takashi Funatsu

Inventor

Tokyo, JP

Overview

2007–2019

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Lprimary

B01LChemical or physical laboratory apparatus for general use14%

C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms14%

B01FMixing, e.g. dissolving, emulsifying or dispersing7%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%

B29CShaping or joining of plastics7%

B29LIndexing scheme associated with subclass b29c, relating to particular articles7%

B62DMotor vehicles7%

F15CFluid-circuit elements predominantly used for computing or control purposes7%

F16KValves7%

G01NInvestigating or analysing materials by determining their chemical or physical properties7%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2007Patents assigned to CALSONIC KANSEI CORP (1)· patent assignee history

2007Patents assigned to JAPAN SCIENCE & TECH CORP (1)· patent assignee history

2007–2019Based in Tokyo, JP· patent location history

2007Based in Tatebayashi, JP· patent location history

2017–2019Patents assigned to UNIV TOKYO (2)· patent assignee history

2017Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history

2019Patents assigned to NIKON CORP (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Tokyo, JP	3	2007–2019
Tatebayashi, JP	1	2007