Inventor
Yung-Yao Lee
Inventor
Zhubei City, TW
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01LSemiconductor devices16%
G01BMeasuring length, thickness or similar linear dimensions9%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
B05CApparatus for applying fluent materials to surfaces, in general2%
B24BMachines, devices, or processes for grinding or polishing2%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general2%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids2%
PatentTitleYear
10,875,148Apparatus and methods for chemical mechanical polishing202010,867,872Method and apparatus for manufacturing semiconductor structure202010,831,110Lithographic overlay correction and lithographic process202010,792,697Drippage prevention system and method of operating same202010,747,128Exposure method and exposure apparatus202010,691,020Apparatus for dispensing liquid material and method for fabricating semiconductor device202010,473,021Exhaust system and method of using201910,157,741Method of manufacturing a semiconductor structure201810,061,215Patterning method and patterning apparatus for fabricating a resist pattern201810,061,211Method for layoutless overlay control20189,978,625Semiconductor method and associated apparatus20189,927,719'Overlay sampling methodology'20189,841,687'Synchronized integrated metrology for overlay-shift reduction'20179,772,561'Semiconductor manufacturing method and tool'20179,766,559'Edge-dominant alignment method in exposure scanner system'20179,646,896'Lithographic overlay sampling'20179,587,929'Focus metrology method and photolithography method and system'20179,563,946'Overlay metrology method and overlay control method and system'20179,188,876'Method of determining overlay error and control system for dynamic control of reticle position'20159,176,396'Overlay sampling methodology'20159,164,398'Overlay metrology method'20158,860,941'Tool induced shift reduction determination for overlay metrology'20148,852,673'Defect monitoring for resist layer'20148,703,368'Lithography process'20148,476,003'Iterative rinse for semiconductor fabrication'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2015Patents assigned to LEE YUNG-YAO (5)· patent assignee history
2013–2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (5)· patent assignee history
2013–2020Based in Zhubei City, TW· patent location history
2014–2015Patents assigned to LIU HENG-HSIN (3)· patent assignee history
2014Patents assigned to WANG YING YING (2)· patent assignee history
2015–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (20)· patent assignee history
2018–2020Based in Hsinchu County, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 20 | 2015–2020 |
| LEE YUNG-YAOself | 5 | 2013–2015 |
| TAIWAN SEMICONDUCTOR MFG | 5 | 2013–2015 |
| LIU HENG-HSIN | 3 | 2014–2015 |
| WANG YING YING | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Zhubei City, TW | 18 | 2013–2020 |
| Hsinchu County, TW | 7 | 2018–2020 |