Inventor
Shingo Kanamitsu
Inventor
Kawasaki, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
B82YSpecific uses or applications of nanostructures9%
H01LSemiconductor devices9%
B29CShaping or joining of plastics7%
H01JElectric discharge tubes or discharge lamps5%
Y10TTechnical subjects covered by former us classification5%
B29LIndexing scheme associated with subclass b29c, relating to particular articles2%
G01MTesting static or dynamic balance of machines or structures2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
11,061,324Manufacturing method of replica template, manufacturing method of semiconductor device, and master template202110,459,355Template substrate and manufacturing method thereof201910,274,821Mask and manufacturing method of mask201910,241,394Pattern formation method, control device, and semiconductor device manufacture method20199,412,592'Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor device'20169,383,641'Method of repairing defect and method of manufacturing semiconductor device'20169,377,682'Template substrate, method for manufacturing same, and template'20168,778,572'Photomask and pattern forming method'20148,758,005'Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor device'20147,947,413'Pattern evaluation method'20117,927,770'Defect correction method for EUV mask'20117,569,313'White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device'20097,541,136'Mask, manufacturing method for mask, and manufacturing method for semiconductor device'20097,371,483'Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device'20087,094,504'Mask, manufacturing method for mask, and manufacturing method for semiconductor device'20066,991,878'Photomask repair method and apparatus'20066,740,456'Method of correcting a photomask and method of manufacturing a semiconductor device'20046,335,129'Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2016Patents assigned to TOSHIBA KK (14)· patent assignee history
2002Based in Fuchu, JP· patent location history
2004Patents assigned to DAINIPPON PRINTING CO LTD (1)· patent assignee history
2004–2019Based in Kawasaki, JP· patent location history
2014–2016Patents assigned to KANAMITSU SHINGO (3)· patent assignee history
2014–2016Patents assigned to ITOH MASAMITSU (2)· patent assignee history
2014–2019Based in Kanagawa, JP· patent location history
2019–2021Patents assigned to TOSHIBA MEMORY CORP (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 14 | 2002–2016 |
| TOSHIBA MEMORY CORP | 4 | 2019–2021 |
| KANAMITSU SHINGOself | 3 | 2014–2016 |
| ITOH MASAMITSU | 2 | 2014–2016 |
| DAINIPPON PRINTING CO LTD | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 9 | 2004–2019 |
| Kanagawa, JP | 7 | 2014–2019 |
| Fuchu, JP | 1 | 2002 |