Inventor
Sabine Emmers
Inventor
Lommel, BE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes67%
C07CAcyclic or carbocyclic compounds17%
C07DHeterocyclic compounds17%
PatentTitleYear
6,607,872'Photothermographic recording material'20036,579,671'Recording materials with improved shelf-life, image tone and/or stability upon thermal development'20036,300,044'Production method for a photothermographic material and a recording process'20016,280,923'Photothermographic recording material'20016,159,667'Thermographic recording material with improved image tone and/or stability upon thermal development'20006,096,486'Thermographic recording material with improved image tone and/or stability upon thermal development'20005,998,087'Photographic material containing a new hydrazide type'19995,989,774'Photographic material containing a new hydrazide type'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999Patents assigned to AGFA GEVAERT NV (2)· patent assignee history
1999–2003Based in Lommel, BE· patent location history
2000–2003Patents assigned to AGFA GEVAERT (6)· patent assignee history
2001–2003Based in Duffel, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGFA GEVAERT | 6 | 2000–2003 |
| AGFA GEVAERT NV | 2 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lommel, BE | 6 | 1999–2003 |
| Duffel, BE | 2 | 2001–2003 |