Inventor
Tutomu Ueyama
Inventor
Kyoto, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01DMeasuring not specially adapted for a specific variable13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H01LSemiconductor devices13%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
PatentTitleYear
10,985,289Solar cell and solar cell module20216,099,643'Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section'20005,963,753'Substrate processing apparatus'19994,751,383'Method and apparatus for detection of position with correction of errors caused by errors in scale pitch'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2000Patents assigned to DAINIPPON SCREEN MFG (3)· patent assignee history
1988Based in Yawata, JP· patent location history
1999–2000Based in Kyoto, JP· patent location history
2021Patents assigned to PANASONIC CORP (1)· patent assignee history
2021Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAINIPPON SCREEN MFG | 3 | 1988–2000 |
| PANASONIC CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 2 | 1999–2000 |
| Osaka, JP | 1 | 2021 |
| Yawata, JP | 1 | 1988 |