Inventor
CHRISTOPHER R. HAUF
Inventor
US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters36%
H10KOrganic electric solid-state devices28%
H01LSemiconductor devices11%
H04NPictorial communication, e.g. television8%
B41MPrinting, duplicating, marking, or copying processes6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
PatentTitleYear
12,552,178Ejection control using imager202612,370,790Ejection control using substrate alignment features and print region alignment features202512,256,626Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances202512,059,910Techniques for manufacturing thin films with improved homogeneity and print speed202411,945,219Ejection control using substrate alignment features and print region alignment features202411,801,687Ejection control using imager202311,678,561Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances202311,628,666Ejection control using substrate alignment features and print region alignment features202311,489,146Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances202211,233,226Nozzle-droplet combination techniques to deposit fluids in substrate locations within precise tolerances202211,203,207Techniques for manufacturing thin films with improved homogeneity and print speed202111,135,854Ejection control using imager202111,135,835Ejection control using substrate alignment features and print region alignment features2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to KATEEVA INC (13)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KATEEVA INC | 13 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 13 | 2021–2026 |