Inventor
Toshiaki Tamamura
Inventor
Katsuta, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
Y10TTechnical subjects covered by former us classification12%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
H05KPrinted circuits5%
B01DSeparation2%
C08LCompositions of macromolecular compounds2%
C25DProcesses for the electrolytic or electrophoretic production of coatings2%
F22GSuperheating of steam2%
PatentTitleYear
7,092,593'Microactuator device and optical switching system using the same'20067,082,251'Optical device'20067,010,200'Light-beam switching/adjusting apparatus and manufacturing method thereof'20067,006,722'Waveguide type optical device and position detecting method'20066,954,562'Matrix switch of optical waveguide type and method for manufacturing the same'20056,395,447'Resist material and fabrication method thereof'20026,177,231'Resist material and fabrication method thereof'20016,139,713'Method of manufacturing porous anodized alumina film'20006,084,050'Thermo-optic devices'20005,598,501'Polyimide optical waveguide and method of manufacturing the same'19975,572,619'Polimide optical waveguide'19964,898,766'Polymer film with conductive pattern and method of manufacturing the same'19904,702,990'Photosensitive resin composition and process for forming photo-resist pattern using the same'19874,608,129'Polymer film with conductive pattern and method of manufacturing the same'19864,564,579'Pattern forming material of a siloxane polymer'19864,559,112'Electrically conducting polymer film and method of manufacturing the same'19854,507,384'Pattern forming material and method for forming pattern therewith'19854,426,247'Method for forming micropattern'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–2002Patents assigned to NIPPON TELEGRAPH & TELEPHONE (13)· patent assignee history
1984–1987Based in Katsuta, JP· patent location history
1990Based in Mito, JP· patent location history
1996–2002Based in Atsugi, JP· patent location history
2000–2006Based in Tokyo, JP· patent location history
2005–2006Patents assigned to NTT ELECTRONICS CORP (3)· patent assignee history
2005–2006Based in Kanagawa, JP· patent location history
2006Patents assigned to NIKON CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON TELEGRAPH & TELEPHONE | 13 | 1984–2002 |
| NTT ELECTRONICS CORP | 3 | 2005–2006 |
| NIKON CORP | 2 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Katsuta, JP | 6 | 1984–1987 |
| Atsugi, JP | 5 | 1996–2002 |
| Tokyo, JP | 4 | 2000–2006 |
| Kanagawa, JP | 2 | 2005–2006 |
| Mito, JP | 1 | 1990 |