Inventor
Kathleen Nafus
Inventor
Leuven, BE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices19%
G03CPhotosensitive materials for photographic purposes13%
G21KHandling of particles or ionising radiation not otherwise provided for13%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
10,490,402UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly201910,438,806Methods and system of using organosilicates as patterning films20199,418,834'System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate'20167,673,278'Enhanced process yield using a hot-spot library'20107,582,414'Method and system for drying a substrate'20097,070,915'Method and system for drying a substrate'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2019Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2006–2009Based in Austin, TX, US· patent location history
2010–2019Based in Leuven, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2006–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Leuven, BE | 4 | 2010–2019 |
| Austin, Texas, US | 2 | 2006–2009 |