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Inventor

JooHyeon Park

Inventor
Chonan, KR

Overview

2→
Patents
2003–2004
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
6,753,126'Polymer for chemically amplified resist and chemically amplified resist composition containing the same'20046,639,036'Acid-labile polymer and resist composition'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2004Patents assigned to KOREA KUMHO PETROCHEM CO LTD (2)· patent assignee history
2003–2004Based in Chonan, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOREA KUMHO PETROCHEM CO LTD22003–2004
Locations
LocationPatentsSpan
Chonan, KR22003–2004