Inventor
Akira Yonezawa
Inventor
Tokyo, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps56%
H05KPrinted circuits11%
Y10TTechnical subjects covered by former us classification11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
B08BCleaning in general4%
B30BPresses in general4%
H01RElectrically-conductive connections4%
LOC194%
PatentTitleYear
7,375,328'Charged particle beam apparatus and contamination removal method therefor'20086,949,745'Electron beam apparatus'20056,897,450'Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens'20056,740,888'Electron beam apparatus'20046,617,579'Scanning electronic beam apparatus'20036,504,164'Electron beam apparatus'2003D0466554'Tape transfer device'20026,351,885'Method of making conductive bump on wiring board'20026,335,530'Objective lens for scanning electron microscope'20026,243,946'Method of forming an interlayer connection structure'20016,037,589'Electron beam device'20005,973,395'IC package having a single wiring sheet with a lead pattern disposed thereon'19995,950,306'Circuit board'19995,241,176'Scanning electron beam microscope with high resolution at low accelerating voltage'19935,023,457'Electron beam device'19914,961,003'Scanning electron beam apparatus'19904,434,367'Electron microscope'19844,429,222'Transmission electron microscope'19844,383,176'Objective lens for electron microscope'19834,219,732'Magnetic electron lens'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–2008Based in Tokyo, JP· patent location history
1983–1984Patents assigned to INT PRECISION INC (3)· patent assignee history
1983–1984Based in Fussa, JP· patent location history
1990–2003Patents assigned to SEIKO INSTR INC (7)· patent assignee history
1990Based in Koto-ku, JP· patent location history
1999–2002Patents assigned to YAMAICHI ELECTRONICS CO LTD (4)· patent assignee history
2000–2005Based in Chiba, JP· patent location history
2002Patents assigned to FUJI KAGAKU SHIKOGYO (1)· patent assignee history
2002Based in Osaka, JP· patent location history
2004–2005Patents assigned to SII NANOTECHNOLOGY INC (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO INSTR INC | 7 | 1990–2003 |
| YAMAICHI ELECTRONICS CO LTD | 4 | 1999–2002 |
| INT PRECISION INC | 3 | 1983–1984 |
| SII NANOTECHNOLOGY INC | 3 | 2004–2005 |
| FUJI KAGAKU SHIKOGYO | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 1980–2008 |
| Chiba, JP | 7 | 2000–2005 |
| Fussa, JP | 3 | 1983–1984 |
| Osaka, JP | 1 | 2002 |
| Koto-ku, JP | 1 | 1990 |