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Inventor

Yoshio Hatada

Inventor
Tokyo, JP

Overview

2→
Patents
1993–1995
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G21Kprimary
G21KHandling of particles or ionising radiation not otherwise provided for33%
H01JElectric discharge tubes or discharge lamps33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
5,395,474'Apparatus and method for etching semiconductor wafer'19955,243,189'Ion neutralizer'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1995Patents assigned to EBARA CORP (2)· patent assignee history
1993–1995Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP21993–1995
Locations
LocationPatentsSpan
Tokyo, JP21993–1995